Vacuum-ultraviolet blazed silicon grating anisotropically etched by native-oxide mask
Vacuum-ultraviolet blazed silicon grating anisotropically etched by native-oxide mask
复制标题
自然氧化物掩模各向异性蚀刻真空紫外闪耀硅光栅
DOI：
10.1364/ol.34.001147
复制
发表时间：
2009-04-15
期刊：
影响因子：
3.6
通讯作者：
Fu, Shaojun
中科院分区：
文献类型：
--
作者：
Sheng, Bin;Xu, Xiangdong;Fu, Shaojun
我们描述了一种控制闪耀光栅轮廓的简单和方便的方法，该方法包括使用经过图案化的非切割硅(111)晶片的自然氧化层作为各向异性刻蚀的掩模，以最大化所需闪耀角度的平滑闪耀面，并最小化沟槽尖端的缺陷。利用这种技术很好地控制了闪耀光栅的面形，得到了闪耀角为5.0度、闪耀面光滑的1200g/mm闪耀光栅。经测试，在真空-紫外光波段具有闪耀效率。(C)2009年美国光学学会
We describe a simple and convenient method of controlling the profile of a blazed grating that consists of using a patterned native-oxide layer of off-cut silicon (111) wafers as the mask of anisotropic etching to maximize the smooth blaze facets of the desired blaze angle and to minimize the deficiencies of the groove apexes. With the blazed-grating profile well controlled by this technique, a 1200 g/mm blazed grating was fabricated that had a blaze angle of 5.0 degrees and smooth blaze facets of about 0.2 nm rms. It was measured to have blaze efficiency in the vacuum-ultraviolet wavelength region. (C) 2009 Optical Society of America