Surface modification of Nb-films during hydrogen loading
Surface modification of Nb-films during hydrogen loading
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DOI：
10.1016/s0925-8388(02)01259-8
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发表时间：
2003-08-11
影响因子：
6.2
通讯作者：
Pundt, A
中科院分区：
文献类型：
--
作者：
Nörthemann, K;Kirchheim, R;Pundt, A
在本文中，我们提出了薄外延铌膜在原位氢，气体曝光期间的STM图像。我们发现，面内应力松弛形成失配位错附近的衬底-薄膜界面可见的滑移台阶在薄膜表面。表面不同滑移台阶的取向表明涉及（011）和（121）滑移面。此外，我们发现，氢化物的安排是不规则的横向和垂直生长通过完整的膜。(C)2002 Elsevier B. V.保留所有权利。
In this paper we present STM images of thin epitaxial Nb-films taken in situ during H, gas-exposure. We find that the in-plane stresses relax by forming misfit dislocations near the substrate-film interface visible as glide steps at the film surface. The orientation of different glide steps at the surface shows that (011) and (121) glide planes are involved. Also, we show that the arrangement of the hydride is irregular in lateral direction and grows vertically through the complete film. (C) 2002 Elsevier B.V. All rights reserved.