Estimating mutagenic compounds generated during photolysis of fenitrothion--by HPLC fractionation followed by mutagenicity testing and high-resolution GC-MS analysis.
Estimating mutagenic compounds generated during photolysis of fenitrothion--by HPLC fractionation followed by mutagenicity testing and high-resolution GC-MS analysis.
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DOI：
10.1016/j.chemosphere.2005.10.046
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发表时间：
2006-06
期刊：
影响因子：
8.8
通讯作者：
T. Matsushita;Y. Matsui;Y. Matsui
中科院分区：
文献类型：
--
作者：
T. Matsushita;Y. Matsui;Y. Matsui
我们的目标是：（1）评价含杀螟松溶液在光解过程中的致突变性变化，以及（2）阐明可能是致突变性主要贡献者的致突变化合物。对该溶液进行了涉及自然阳光照射的批试验，然后对经照射的溶液进行了HPLC分馏、致突变性试验和气相色谱-质谱（GC-MS）分析。在15天的光解过程中，杀螟松几乎完全降解，产生了34种转化产物（TP）。光解降低了含杀螟松溶液对碱基对置换检测试验菌株（YG 1026和YG 1029）的致突变性，但增加了对移码检测试验菌株（YG 1021和YG 1024）的致突变性。一种TP被确定为致突变性增加的潜在来源;其分子式估计为（CH 3 O）2 PS-O-C8 H6 NO。
We aimed to: (1) evaluate the change in mutagenicity of a fenitrothion-containing solution during photolysis and (2) elucidate mutagenic compounds that were possible major contributors to mutagenicity. A batch test involving irradiation by natural sunlight was conducted on the solution, and then HPLC fractionation, mutagenicity testing, and gas chromatography–mass spectrometry (GC–MS) analysis were performed on the irradiated solution. During the 15-day photolysis, fenitrothion was almost completely decomposed, and 34 transformed products (TPs) were generated. Photolysis decreased the mutagenicity of the fenitrothion-containing solution for base-pair-substitution-detecting tester strains (YG1026 and YG1029) but increased mutagenicity for frameshift-detecting tester strains (YG1021 and YG1024). One TP was identified as a potential source of the increased mutagenicity; its molecular formula was estimated to be (CH3O)2PS–O–C8H6NO.