Relationship Between Electrode- to- Modiolus Distance and Current Levels for Adults With Cochlear Implants
Relationship Between Electrode- to- Modiolus Distance and Current Levels for Adults With Cochlear Implants
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DOI：
10.1097/mao.0000000000000896
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发表时间：
2016-01-01
影响因子：
2.1
通讯作者：
Noble, Jack H.
中科院分区：
文献类型：
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作者：
Davis, Timothy J.;Zhang, Dongqing;Noble, Jack H.
假设：电极-蜗轴距离与临床程控刺激levels.Background相关：传统的智慧早已假定耳蜗植入（CI）刺激水平和电极-蜗轴距离之间存在显着关系;然而，迄今为止，还没有完成这样的正式调查。因此，本项目的目的是研究刺激水平和电极到蜗轴距离之间的关系。两者之间的强相关性表明，刺激水平可能被用来估计电极-蜗轴geometry.Methods：电极-蜗轴距离通过CT成像使用验证CI位置分析软件在137个植入耳从三个制造商持有FDA批准在美国。分析共包括2，365个电极，其中1，472个来自双列阵列。结果：用蜗轴周围电极和侧壁电极测量的平均蜗轴距离分别为0.47和1.15mm。各制造商之间的平均阈上电荷值存在显著差异。当结合所有数据时，我们发现中度正相关（r=0.367，p
Hypothesis:Electrode-to-modiolus distance is correlated with clinically programmed stimulation levels.Background:Conventional wisdom has long supposed a significant relationship between cochlear implant (CI) stimulation levels and electrode-to-modiolus distance; however, to date, no such formal investigation has been completed. Thus, the purpose of this project was to investigate the relationship between stimulation levels and electrode-to-modiolus distance. A strong correlation between the two would suggest that stimulation levels might be used to estimate electrode-to-modiolus geometry.Methods:Electrode-to-modiolus distance was determined via CT imaging using validated CI position analysis software in 137 implanted ears from the three manufacturers holding FDA approval in the United States. Analysis included 2,365 total electrodes, with 1,472 from precurved arrays. Distances were compared to clinically programmed C/M levels that were converted to charge units.Results:Mean modiolar distance with perimodiolar and lateral wall electrodes was 0.47 and 1.15mm, respectively. Mean suprathreshold charge values were significantly different between each manufacturer. When combining all data, we found a moderate positive correlation (r=0.367, p