Surface profile measurement of a highly reflective silicon wafer by phase-shifting interferometry
Surface profile measurement of a highly reflective silicon wafer by phase-shifting interferometry
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DOI：
10.1364/ao.54.004207
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发表时间：
2015-05
期刊：
影响因子：
1.9
通讯作者：
Yangjin Kim;K. Hibino;N. Sugita;M. Mitsuishi
中科院分区：
文献类型：
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作者：
Yangjin Kim;K. Hibino;N. Sugita;M. Mitsuishi
在相移斐索干涉仪中，相移误差和多光束干涉是影响高精度相位测量的最常见的系统误差源。采用4个以上采样点的同步检波，可以使非正弦波形最小化。然而，当相移校准不准确时，这些算法不能消除非正弦特性的影响。此外，当测量高反射率样品的表面轮廓时，计算的相位不仅由条纹对比度的降低而且由谐波和相移误差之间的耦合误差严格地确定。在考虑耦合误差的情况下，对传统移相算法计算的相位误差进行了估计。我们表明，4 N-3算法，包括多项式窗函数和DFT项，具有最小的相位误差之间的传统相移算法。使用波长调谐Fizeau干涉仪和4 N −3算法测量高反射硅晶片的表面轮廓。
In phase-shifting Fizeau interferometers, the phase-shift error and multiple-beam interference are the most common sources of systematic error affecting high-precision phase measurements. The nonsinusoidal waveforms can be minimized by applying synchronous detection with more than 4-sample. However, when the phase-shift calibration is inaccurate, these algorithms cannot eliminate the effects of nonsinusoidal characteristics. Moreover, when measuring the surface profile of highly reflective samples, the calculated phase is critically determined not only by the decrease in the fringe contrast but also by the coupling error between the harmonics and phase-shift error. In this paper, the phase errors calculated by conventional phase-shifting algorithms were estimated by considering the coupling error. We show that the 4N−3 algorithm, comprising the polynomial window function and the DFT term, has the smallest phase error among the conventional phase-shifting algorithms. The surface profile of the highly reflective silicon wafer was measured using a wavelength-tuning Fizeau interferometer and the 4N−3 algorithm.