Nanoscale phase separation in epitaxial Cr-Mo and Cr-V alloy thin films studied using atom probe tomography: Comparison of experiments and simulation
Nanoscale phase separation in epitaxial Cr-Mo and Cr-V alloy thin films studied using atom probe tomography: Comparison of experiments and simulation
复制标题
使用原子探针断层扫描研究外延 Cr-Mo 和 Cr-V 合金薄膜的纳米级相分离:实验与模拟的比较
DOI:
10.1063/1.4901465
复制
发表时间:
2014
影响因子:
3.2
通讯作者:
R. Kurtz
中科院分区:
文献类型:
--
作者:
A. Devaraj;T. Kaspar;Sathvik Ramanan;Sarita K. Walvekar;M. Bowden;V. Shutthanandan;R. Kurtz
Tailored metal alloy thin film-oxide interfaces generated using molecular beam epitaxy (MBE) deposition of alloy thin films on a single crystalline oxide substrate can be used for detailed studies of irradiation damage response on the interface structure. However, the presence of nanoscale phase separation in the MBE grown alloy thin films can impact the metal-oxide interface structure. Due to nanoscale domain size of such phase separation, it is very challenging to characterize by conventional techniques. Therefore, laser assisted atom probe tomography (APT) was utilized to study the phase separation in epitaxial Cr0.61Mo0.39, Cr0.77Mo0.23, and Cr0.32V0.68 alloy thin films grown by MBE on MgO(001) single crystal substrates. Statistical analysis, namely frequency distribution analysis and Pearson coefficient analysis of experimental data was compared with similar analyses conducted on simulated APT datasets with known extent of phase separation. Thus, the presence of phase separation in Cr-Mo films, even ...