Mesoporous catalytic filters for semiconductor gas sensors
Mesoporous catalytic filters for semiconductor gas sensors
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DOI：
10.1016/s0040-6090(03)00510-8
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发表时间：
2003-07-22
期刊：
影响因子：
2.1
通讯作者：
Liu, ML
中科院分区：
文献类型：
--
作者：
Cabot, A;Arbiol, J;Liu, ML
提高传感器选择性和稳定性的一种有效方法是使用催化过滤器来阻止干扰和中毒气体分子到达传感器表面。具有高电阻率和高表面积的介孔二氧化硅非常适合作为该应用的基础材料。当浸渍适当的催化剂，介孔二氧化硅具有很大的潜力，以消除不需要的气体，甚至薄膜和/或微机械传感器的响应。在本文中，我们报告了我们的初步结果厚膜SnO 2基气体传感器覆盖的催化过滤器组成的Pd和Pt负载的介孔二氧化硅。结果表明，在催化过滤器中的CO的选择性氧化导致消除CO干扰的CH，传感器的传感性能没有明显的恶化。(C)2003 Elsevier Science B. V.保留所有权利。
An effective way to improve sensor selectivity and stability is the use of catalytic filters to block interfering and poisoning gas molecules from reaching the sensor surface. Mesoporous silica with high resistivity and hugh surface areas are ideally suited as a base material for this application. When impregnated with proper catalysts, mesoporous silica has a great potential to eliminate responses to undesired gases even of thin-film and/or micro-machined sensors. In this paper, we report our initial results on thick film SnO2-based gas sensors covered with a catalytic filter consisting of Pd and Pt loaded mesoporous silica. Results indicate that selective oxidation of CO in the catalytic filter leads to the elimination of CO interference to a CH, sensor with no perceptible deterioration in sensing performance. (C) 2003 Elsevier Science B.V. All rights reserved.