Organic depth profiling of C60 and C60/phthalocyanine layers using argon clusters
Organic depth profiling of C60 and C60/phthalocyanine layers using argon clusters
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DOI：
10.1002/sia.5052
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发表时间：
2013-01
影响因子：
1.7
通讯作者：
T. Mouhib;C. Poleunis;R. Möllers;E. Niehuis;P. Defrance;P. Bertrand;A. Delcorte
中科院分区：
文献类型：
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作者：
T. Mouhib;C. Poleunis;R. Möllers;E. Niehuis;P. Defrance;P. Bertrand;A. Delcorte
分子半导体器件，如发光二极管和光伏电池，最近受到了相当大的关注，因为它们与柔性衬底和大面积应用的兼容性。由于界面性质对于器件性能的重要性，这些有机（多）层构成了通过西姆斯进行分子深度剖析的重要应用领域。在这篇文章中，我们研究了使用不同能量（范围从2.5到20 keV）的C60 n+和Ar 1000 -2000+团簇射弹作为溅射离子，用于富勒烯基薄膜和异质结的有机深度分析。该双层膜由沉积在硅衬底上的酞菁锡（SnPc）上的C60富勒烯组成。我们的初步结果表明，C60薄膜不能成功地使用C60 n+离子在常规的分析条件（室温）。与此相反，与Ar簇，深度剖析是成功的（除了20千电子伏Ar 1000）和溅射的体积与Ar簇的能量呈线性关系。令人惊讶的是，对于给定的射弹总能量，Ar 2000的射程大约是Ar 1000的两倍。这些观察结果被初步解释为不同轰击条件下溅射和交联效率之间平衡的结果，预计较大的簇比具有相同总能量的较小簇自然诱导较少的交联。版权所有© 2012约翰威利父子有限公司.
Molecular semiconductor devices, such as light‐emitting diodes and photovoltaic cells, have recently received considerable attention because of their compatibility with flexible substrates and large‐area applications. Because of the importance of the interfacial properties for the performance of the devices, these organic (multi)layers constitute an important field of application for molecular depth profiling by SIMS. In this contribution, we investigate the use of C60n+ and Ar1000–2000+ cluster projectiles at different energies (ranging from 2.5 to 20 keV) as sputter ions for the organic depth profiling of fullerene‐based films and heterojunctions. The bilayers consist of C60 fullerenes on tin phthalocyanine (SnPc), deposited on silicon substrates. Our preliminary results showed that C60 films could not be successfully profiled using C60n+ ions in regular analysis conditions (room temperature). In contrast, with Ar clusters, the depth profiling is successful (except for 20 keV Ar1000) and the sputtered volume shows a linear relationship with the Ar cluster energy. Surprisingly, for a given total energy of the projectiles, Ar2000 sputters approximately two times more than Ar1000. The observations are tentatively explained as being the result of a balance between the sputtering and the cross‐linking efficiency for the different bombardment conditions, larger clusters being expected to naturally induce less cross‐linking than smaller clusters with the same total energy. Copyright © 2012 John Wiley & Sons, Ltd.