Dilute aqueous base developable resists for environmentally friendly and biocompatible processes
Dilute aqueous base developable resists for environmentally friendly and biocompatible processes
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DOI：
10.1016/s0167-9317(02)00451-3
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发表时间：
2002-07-01
影响因子：
2.3
通讯作者：
Argitis, P
中科院分区：
文献类型：
--
作者：
Diakoumakos, CD;Douvas, A;Argitis, P
介绍了可在稀水性碱中显影的光致抗蚀剂，用于环境友好的光致抗蚀剂处理和生物杀菌。提出的光致抗蚀剂是正负色调的，化学放大，基于合成的(甲基)丙烯酸酯共聚物，分别含有侧基叔丁酯或2-羟乙酯基团，用于正负成像。给出了用13×10(-3)M TMAH溶液显影的正极(甲基)丙烯酸酯化学放大抗蚀剂配方所获得的特征高分辨率光刻结果(0.13微米线)。另一方面，略微改进的抗蚀剂配方被用于生物兼容条件下的生物分子构图和蛋白质微结构(
Photoresists developable in dilute aqueous bases are introduced for environmentally friendly photoresist processing and biopatterning. The proposed photoresists are of positive or negative tone, chemically amplified, based on synthesized (meth)acrylate copolymers bearing either pendant t-butyl ester group or 2-hydroxylethyl ester group for positive and negative imaging, respectively. Characteristic high-resolution lithographic results (0.13 mum lines) obtained with a positive (meth)acrylate-based chemically amplified resist formulation upon development with 13 x 10(-3) M TMAH solution are presented. On the other hand, a slightly modified resist formulation was used for biomolecule patterning under biocompatible conditions and protein microstructures (