Electric field dependence of topography in ferroelectric P(VDF/TrFE) films
Electric field dependence of topography in ferroelectric P(VDF/TrFE) films
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DOI：
10.1016/j.apsusc.2006.05.007
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发表时间：
2006-12
影响因子：
6.7
通讯作者：
Guodong Zhu;Jing Xu;Z. Zeng;Li Zhang;Xue-jian Yan;Jie Li
中科院分区：
文献类型：
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作者：
Guodong Zhu;Jing Xu;Z. Zeng;Li Zhang;Xue-jian Yan;Jie Li
研究了电场对P（VDF/TrFE）铁电薄膜形貌和结构的影响。通过扫描探针显微镜观察了在25°C极化处理后的形态变化，从先前的chelum-like结构到规则且平行的slug状结构域。在较高的温度极化过程中诱导更大的形态变化。局部电学性质的成像表明，这些变化不能归因于极化过程中注入到薄膜表面的局部电荷的影响。认为这种新的形貌来源于电场对薄膜结构的改革。
The effect of electric fields on the topography and structures in P(VDF/TrFE) ferroelectric films was studied. The morphological changes after poling treatment at 25°C, from previously chrysanthemum-like structures to regular and parallel slug-like domains, were observed by scanning probe microscope. Poling process at higher temperature induced even greater morphological changes. Imaging of local electrical properties showed that these changes could not be attributed to the influence of local charges injected into film surface during poling process. It was believed that this new morphology came from the reform of film structures induced by electric fields.