Effects of ratio of hydrogen flow on microstructure of hydrogenated microcrystalline silicon films deposited by magnetron sputtering at 100 degrees C
Effects of ratio of hydrogen flow on microstructure of hydrogenated microcrystalline silicon films deposited by magnetron sputtering at 100 degrees C
复制标题
氢气流量比例对100℃磁控溅射沉积氢化微晶硅薄膜微观结构的影响
DOI：
10.1007/s11771-019-4203-7
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发表时间：
2019
期刊：
影响因子：
--
通讯作者：
Liu Xue-qin
中科院分区：
文献类型：
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作者：
Wang Lin-qing;Zhou Yong-tao;Wang Jun-jun;Liu Xue-qin
