Selective Wetting and Localization of Silica in Binary and Ternary Blends Based on Styrene Butadiene
Selective Wetting and Localization of Silica in Binary and Ternary Blends Based on Styrene Butadiene
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DOI:
10.1002/mame.201200307
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发表时间:
2013-10
期刊:
影响因子:
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通讯作者:
H. H. Le-H.;M. Keller;M. Hristov;S. Ilisch;T. Xuan;Q. Do;T. Pham;K. Stöckelhuber;G. Heinrich;H. Radusch
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文献类型:
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作者:
H. H. Le-H.;M. Keller;M. Hristov;S. Ilisch;T. Xuan;Q. Do;T. Pham;K. Stöckelhuber;G. Heinrich;H. Radusch
In the present work, the wetting concept was further developed for explanation of the kinetics of silica localization in binary and ternary rubber blends in the first mixing period. In the second mixing period when the wetting process is finished, a re-localization process of silica within the blend phases takes place until an equilibrium state is reached. Material effects and mixing conditions on the silica localization were systematically characterized. A comparison between the kinetics of filler localization experimentally determined by the wetting concept, and the filler localization at an equilibrium theoretically predicted by our Z-model, provides a deeper insight intothefillertransferprocesstakingplace during the mixing process.