Optimization of directed self-assembly hole shrink process with simplified model
Optimization of directed self-assembly hole shrink process with simplified model
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简化模型定向自组装缩孔工艺优化
DOI：
10.1117/1.jmm.13.3.031305
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发表时间：
2014
期刊：
影响因子：
--
通讯作者：
Shoji Mimotogi
中科院分区：
文献类型：
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作者：
Kenji Yoshimoto;Ken Fukawatase;Masahiro Ohshima;Yoshihiro Naka;Shimon Maeda;Satoshi Tanaka;Seiji Morita;Hisako Aoyama;Shoji Mimotogi
嵌段共聚物定向自组装在孔收缩工艺中的应用因其低成本和亚光刻图案化的高潜力而受到广泛关注。在这项研究中，我们采用了一个称为 Ohta-Kawasaki 模型的简化模型来寻找最佳工艺条件，最大限度地减少二嵌段共聚物 PS-b-PMMA 的形态缺陷。使用横截面透射电子显微镜图像校准模型参数。我们的模拟结果表明，仅通过改变导孔的形状很难消除形态缺陷（即PS残留层）。事实证明，将导孔底面的亲和力从“PMMA吸引”改为“中性”是获得相当宽的、无缺陷工艺窗口的更有效方法。请注意，我们的模拟不仅计算成本低廉，而且还可以与其他详细模型（例如自洽场论）相媲美；它们也可能适用于大规模模拟，例如大面积的热点分析。
Application of the directed self-assembly of block copolymer to the hole shrink process has gained large attention because of the low cost and high potential for sublithographic patterning. In this study, we have employed a simplified model, called the Ohta-Kawasaki model to find the optimal process conditions, which minimize the morphological defects of the diblock copolymer, PS-b-PMMA. The model parameters were calibrated with cross-sectional transmission electron microscopy images. Our simulation results revealed that it is difficult to eliminate the morphological defects (i.e., PS residual layer) by only varying the shape of the guide hole. It turned out that changing the affinity of the bottom surface of the guide hole from “PMMA attractive” to “neutral” is a more effective way to obtain a reasonably wide, defect-free process window. Note that our simulations are not only computationally inexpensive, but are also comparable to the other detailed models such as the self-consistent field theory; they may also be feasible for large-scale simulations such as the hotspot analysis over a large area.