Formation of High Crystallinity Silicon Films by High Speed Scanning of Melting Region Formed by Atmospheric Pressure DC Arc Discharge Micro-Thermal-Plasma-Jet and Its Application to Thin Film Transistor Fabrication
Formation of High Crystallinity Silicon Films by High Speed Scanning of Melting Region Formed by Atmospheric Pressure DC Arc Discharge Micro-Thermal-Plasma-Jet and Its Application to Thin Film Transistor Fabrication
复制标题
大气压直流电弧放电微热等离子射流熔化区高速扫描形成高结晶硅薄膜及其在薄膜晶体管制造中的应用
DOI：
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发表时间：
2010
期刊：
影响因子：
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通讯作者：
S.Miyazaki
中科院分区：
文献类型：
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作者：
S.Hayashi;S.Higashi;H.Murakami;S.Miyazaki
