Sub-wavelength optical diffraction and photoacoustic metrologies for the characterisation of nanoimprinted structures
Sub-wavelength optical diffraction and photoacoustic metrologies for the characterisation of nanoimprinted structures
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用于表征纳米压印结构的亚波长光学衍射和光声计量
DOI：
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发表时间：
2008
期刊：
影响因子：
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通讯作者：
C. S. Sotomayor Torres
中科院分区：
文献类型：
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作者：
T. Kehoe;J. Bryner;V. Reboud;N. Kehagias;S. Landis;C. Gourgon;J. Vollmann;J. Dual;C. S. Sotomayor Torres
我们报告使用两个原始技术的质量评价纳米压印光刻与50 nm的特征尺寸：亚波长闪耀衍射光栅和光声计量。亚波长衍射已经被用于通过研究来自光栅的可见波长的光的衍射图案来表征纳米结构，所述光栅由低于衍射极限的特征组成。衍射级的衍射效率与光栅的线宽、高度和缺陷有关。采用电子束光刻和反应离子刻蚀技术在硅上制作了亚波长闪耀光栅的印模，并采用不同的工具进行了近红外压印。测得的衍射效率同意从有限差分时域模拟，我们证明了区分衍射图案成功压印光栅和那些有缺陷的可能性。首次将光声方法用于纳米压印聚合物的研究。从顶部和底部的界面的聚合物层与铝和硅，分别获得的信号，并从声波的飞行时间和建模的聚合物的物理参数计算的厚度，同意与轮廓测量。
We report on the use of two original techniques for the quality evaluation of nanoimprint lithography with 50 nm feature size: sub-wavelength blazed diffraction gratings and photoacoustic metrology. Sub-wavelength diffraction has been used to characterise nanoscale structures by studying the diffraction patterns of visible wavelengths of light from gratings which are made up of features below the diffraction limit. Diffraction efficiencies of the diffracted orders are related to the nanoscale line-widths, heights and defects of the gratings. A stamp of a sub-wavelength blazed grating was fabricated by electron beam lithography and reactive ion etching in silicon and imprinted by NIL with different tools. Measured diffraction efficiencies agree with those from finite difference time domain simulations and we demonstrated the possibility to distinguish diffraction patterns from successfully imprinted gratings and those with a defect. The photoacoustic method has been used for the first time to study nanoimprint polymers. Signals were obtained from the top and bottom interfaces of polymer layers with aluminium and silicon, respectively, and thicknesses calculated from the time of flight of the acoustic wave and modelling physical parameters of the polymers, agree well with those measured by profilometry.