Cation intercalation in sputter-deposited W oxide films
Cation intercalation in sputter-deposited W oxide films
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溅射沉积钨氧化物薄膜中的阳离子插层
DOI：
10.1103/physrevb.58.11015
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发表时间：
1998
期刊：
影响因子：
--
通讯作者：
M. S. Mattsson
中科院分区：
文献类型：
--
作者：
M. S. Mattsson
用电化学和x射线衍射研究了Li、Na和K离子在溅射无定形单斜W氧化物中的插层。结果表明，在低浓度下，Li和K的插入都引起了晶体的相分离
Intercalation of Li, Na, and K ions into sputtered amorphous and monoclinic W oxide has been studied electrochemically and by x-ray diffraction. It was found that both Li and K intercalation, at low concentrations, caused a phase separation in the crystal