Surface roughness of ultra‐thin silver films sputter depositedon a glass

Surface roughness of ultra‐thin silver films sputter depositedon a glass
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玻璃上溅射沉积的超薄膜银膜的表面粗糙度

DOI:
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发表时间:
2008
影响因子:
2
通讯作者:
S. Štrbac
S. Štrbac
中科院分区:
工程技术4区
文献类型:
--
作者:
Z. Rakočević;R. Petrović;S. Štrbac

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将银溅射沉积在玻璃上,薄膜厚度为10至80 nm。扫描隧道显微镜被用来研究所获得的银玻璃表面的形态,并估计表面粗糙度。薄膜的表面粗糙度的方程进行了评估,使用相关的参数的薄膜功能:基板的表面粗糙度,薄膜的可压缩性和膜厚度。利用评价方程对实验结果进行了拟合,并分析了有利于降低或提高表面粗糙度的条件。
Silver was sputter deposited on a glass with a thin film thickness ranging from 10 to 80 nm. Scanning tunnelling microscopy was used to study the morphology of the obtained Ag–glass surfaces and to estimate the surface roughness. An equation for the surface roughness of the thin film was evaluated using parameters related to the thin film features: the surface roughness of the substrate, the compressibility of the thin film and the film thickness. The experimental results were fitted using the evaluated equation, and the conditions favouring lower or higher surface roughness were analyzed.
DOI: 10.1021/ac00003a010
发表时间: 1991-02-01
影响因子: 7.4
作者:
SCHLEGEL, VL;COTTON, TM
通讯作者: COTTON, TM