Enhancement of photoluminescence from silicon nanocrystals by metal nanostructures made by nanosphere lithography
Enhancement of photoluminescence from silicon nanocrystals by metal nanostructures made by nanosphere lithography
复制标题
DOI：
10.1063/1.3159030
复制
发表时间：
2009-07-01
影响因子：
3.2
通讯作者：
Akamatsu, Kensuke
中科院分区：
文献类型：
--
作者：
Mochizuki, Yugo;Fujii, Minoru;Akamatsu, Kensuke
研究了纳米球光刻技术制备的金属纳米结构对硅纳米晶(Si-NCS)光致发光特性的影响。通过在含有Si-NCS的SiO(2)薄膜上放置Ag纳米三角形或Au纳米空穴，增强了发光强度。对于具有银纳米三角形的样品，当激发波长与银纳米三角形的吸收带重合时，发光增强最大。这表明，表面等离子体激元(SPP)激发对入射场的增强是光致发光增强的原因。另一方面，对于具有Au纳米空洞的样品，发光增强主要是通过有效激发和散射SPP来提高Si-NCS的有效辐射衰减率。
The effect of metal nanostructures prepared by nanosphere lithography on photoluminescence (PL) properties of silicon nanocrystals (Si-ncs) is studied. By placing Ag nanotriangles or Au nanovoids on SiO(2) films containing Si-ncs, the PL intensity is enhanced. For the sample having Ag nanotriangles, the largest PL enhancement is obtained when the excitation wavelength coincides with the absorption band of Ag nanotriangles. This suggests that the enhancement of the incident field by surface plasmon polariton (SPP) excitation is responsible for the PL enhancement. On the other hand, for the sample having Au nanovoids, the PL enhancement is mainly made by the enhancement of effective radiative decay rate of Si-ncs by efficient excitation and scattering of SPPs.