A metal oxide TFT gate driver with a single negative power source employing a boosting module
A metal oxide TFT gate driver with a single negative power source employing a boosting module
复制标题
DOI:
10.1080/15980316.2019.1689190
复制
发表时间:
2020-01
影响因子:
3.7
通讯作者:
Yan-Gang Xu;Jun-Wei Chen;Wen-Xing Xu;Lei Zhou;Weijing Wu;J. Zou;Miao Xu;L. Wang;Junbiao Peng
中科院分区:
文献类型:
--
作者:
Yan-Gang Xu;Jun-Wei Chen;Wen-Xing Xu;Lei Zhou;Weijing Wu;J. Zou;Miao Xu;L. Wang;Junbiao Peng
This paper presents a new gate driver integrated by In-Zn-O thin-film transistors (IZO TFTs) with the etch stop layer (ESL) structure, in which only a single negative power source is used on account of a new boosting module. The boosting module is controlled only by the VIN signal for generating a lower level than VSS. The proposed gate driver with 15 stages is fabricated through the IZO TFT process on a glass substrate to verify its function. The experiment results showed that the proposed gate driver can successfully output full-swing waveforms with resistive load RL=2 kΩ and capacitive load CL=30 pF at the 16.7 and 66.7 kHz clock frequencies, and can also output as small as 3.2 μs pulse width with little distortion, revealing good stability.