The oxidation behavior of Ce-implanted ZrN coating

The oxidation behavior of Ce-implanted ZrN coating
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DOI:
10.1016/j.apsusc.2004.04.024
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发表时间:
2004-09
影响因子:
6.7
通讯作者:
Q. G. Zhou;X. Bai;X. Xue;Yun-han Ling;Xiaotong Chen;Jianbin Xu;Dongbo Wang
Q. G. Zhou;X. Bai;X. Xue;Yun-han Ling;Xiaotong Chen;Jianbin Xu;Dongbo Wang
中科院分区:
材料科学1区
文献类型:
--
作者:
Q. G. Zhou;X. Bai;X. Xue;Yun-han Ling;Xiaotong Chen;Jianbin Xu;Dongbo Wang

文献摘要

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研究目的是探讨铈离子注入对ZrN涂层氧化行为的影响。通过阴极电弧沉积沉积样品,随后使用MEVVA离子注入器注入不同剂量的铈。离子引出电压为40 kV,剂量范围为5× 1016 ~ 2× 1017 ions/cm ~ 2。采用增重法研究了沉积态ZrN涂层和Ce离子注入ZrN涂层在500°C空气中的氧化行为。低剂量铈离子注入后,ZrN涂层的抗氧化性能下降,但在较高剂量时,涂层的抗氧化性能有所回升。在0、5×1016、1× 1017和2× 1017 ions/cm 2剂量下,ZrN涂层的氧化速率分别为2.18×10−7、5.21×10−8、4.18×10− 7和1.56×10− 7 mg 2cm −4s− 1。采用X射线光电子能谱和掠射角X射线衍射分别对氧化膜的价态和氧化层的相组成进行了分析。铈离子注入可以提高ZrN涂层的抗氧化性能。最后讨论了氧化行为的机理。
The aim of the study was to investigate the influence of cerium ion implantation on the oxidation behavior of ZrN coating. Samples was deposited by cathodic arc deposition and subsequently implanted with different doses of cerium using a MEVVA ion implanter. The ions were extracted with a voltage of 40kV, and the dose ranged from 5×1016to 2×1017ions/cm2. The air oxidation behaviors at 500°C of as-deposited and Ce-implanted ZrN coatings were characterized by weight gain measurement. The oxidation resistance of ZrN coating reduced after implantation with cerium at low dose but rebounded at higher dose. The oxidation rate of ZrN coatings were 2.18×10−7, 5.21×10−8, 4.18×10−7and 1.56×10−7mg2cm−4s−1with dose of 0, 5×1016, 1×1017and 2×1017ions/cm2. X-ray photoelectron spectroscopy and glancing angle X-ray diffraction were employed to analyze the valence states of the oxide scale and the phase composition of the oxidation layers, respectively. Cerium implantation could improve the oxidation resistance of ZrN coating with higher dose. Finally, the mechanism of the oxidation behavior is discussed.