Influence of nanosilica on inner structure and performance of chitosan based films
Influence of nanosilica on inner structure and performance of chitosan based films
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DOI：
10.1016/j.carbpol.2019.02.079
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发表时间：
2019-05-15
影响因子：
11.2
通讯作者：
Xu, Qi
中科院分区：
文献类型：
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作者：
Liu, Yuanyuan;Cai, Zhaoxia;Xu, Qi
为了提高壳聚糖基有机-无机复合膜的性能，将纳米SiO2粒子直接引入壳聚糖基有机-无机复合膜中，制备了壳聚糖基有机-无机复合膜。纳米SiO2的加入使成膜液的粘度明显降低，且纳米SiO2含量为25%的成膜液的G'值高于其它纳米SiO2含量的成膜液。在低场核磁共振（LF-NMR）测定中，加入25%的纳米SiO2使T-21组分的弛豫时间和峰面积比例最低。通过FTIR、SEM和XRD分析了不同纳米SiO2含量的复合膜结构特征的变化。薄膜的热稳定性随着纳米二氧化硅含量的增加而显著提高。当纳米二氧化硅的质量分数为25%时，薄膜的力学性能最佳。此外，纳米二氧化硅的引入显著（p < 0.05）降低了基于壳聚糖的膜在pH 7.6和pH 2.6下的溶胀率。
Chitosan based organic-inorganic composite films were prepared through direct incorporation of nanosilica particles in order to enhance their performance for potential packaging material. After the addition of nanosilica, the viscosity of film-forming solutions (FFSs) decreased obviously, and the G' of FFS with 25% of nanosilica was higher than that of other FFSs with nanosilica. In low field nuclear magnetic resonance (LF-NMR) determination, the addition of 25% of nanosilica gave rise to the lowest relaxation time and peak area proportion of T-21 component. Additionally, the changes of structure characteristic of composite films with different nanosilica content were analyzed through FTIR spectroscopy, SEM and XRD analysis. The thermal stability of films improved markedly with increasing nanosilica. The optimal mechanical properties of films were yielded at 25% of nanosilica. Furthermore, the introduction of nanosilica significantly (p < 0.05) decreased the swelling ratio of chitosan based films at pH 7.6 and pH 2.6.