Development of Penning Multiply Charged Ion Sources for the Unilac
Development of Penning Multiply Charged Ion Sources for the Unilac
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DOI：
10.1109/tns.1976.4328400
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发表时间：
1976-04
影响因子：
1.8
通讯作者：
H. Schulte;W. Jacoby;B. Wolf
中科院分区：
文献类型：
--
作者：
H. Schulte;W. Jacoby;B. Wolf
两种类型的PIG源适合于产生多电荷金属离子目前正在研究的测试台上：一个是杜布纳型源配备有溅射电极类似于Tretyakov的设计。阳极的中心部分运行得非常热，以实现溅射材料的有效再蒸发。此外，已经应用了通过使用烘箱的源进料。另一种源使用等离子体加热的阴极和几乎完全围绕等离子体柱的圆柱形溅射电极。对于这两种源类型，Ar优选作为支持气体;总提取电流中的金属离子含量范围为约100%至约100%。10%至80%，取决于源类型和金属种类。在其它离子中，已经获得了Ta 10+、Au 9+、Bi 10+和U 11+。
Two types of PIG sources suitable for generation of multiply charged metal ions are currently under investigation on the test bench: One is a Dubna type source equipped with a sputtering electrode similar to Tretyakov's design. The central part of the anode is run very hot to achieve effective re-evaporation of the sputtered material. Furthermore, source feed by use of ovens has been applied. The other source uses plasma-heated cathodes, and sputtering electrodes of cylindrical shape surrounding the plasma column almost entirely. For both source types, Ar is preferred as support gas; the content of metal ions in the total extracted current ranges from approx. 10 % up to 80 %, depending on source type and metal species. Among other ions, Ta10+, Au9+, Bi10+ and U11+ have been obtained.