Vapor-phase synthesis of mesoporous silica thin films
Vapor-phase synthesis of mesoporous silica thin films
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DOI：
10.1021/cm021011p
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发表时间：
2003-02-25
影响因子：
8.6
通讯作者：
Ueyama, K
中科院分区：
文献类型：
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作者：
Nishiyama, N;Tanaka, S;Ueyama, K
在介孔薄膜的制备中，发现了有机-无机纳米复合材料在正硅酸乙酯（TEOS）或正硅酸乙酯（TMOS）的气相渗透作用下的纳米相变。重排成六方周期性结构意味着在固相中的表面活性剂-硅酸盐复合物的高流动性。在气相渗透条件下，薄膜厚度和间距均发生了膨胀。气相渗透下的纳米相变包含两个竞争过程：（1）TEOS或TMOS向膜中的渗透和（2）硅烷醇基团的反应。通过改变合成温度、硅源（TEOS和TMOS）、催化剂（HCl和NH3）以及表面活性剂膜的厚度来控制膜的厚度和d间距。由气相制备的膜显示出上级特性，例如高结构稳定性和高抗水吸附性。气相渗透法是一种比传统溶胶-凝胶技术更简单的工艺，对于各种有机-无机复合材料和无机多孔膜的大量生产具有吸引力。
Nano-phase transition of an organic-inorganic nanocomposite under vapor infiltration of tetraethoxysilane (TEOS) or tetramethoxysilane (TMOS) was found in mesoporous thin film preparation. The rearrangement into a hexagonal periodic structure implies high mobility of the surfactant-silicate composites in solid phase. The swelling of film thickness and d spacing was observed under vapor infiltration. The nano-phase transition under vapor infiltration contains two competitive processes: (1) the penetration of TEOS or TMOS into the film and (2) the reaction of the silanol group. Film thickness and d spacing were controlled by changing synthetic temperature, silica sources (TEOS and TMOS), catalysts (HCl and NH3), and the thickness of surfactant films. The films prepared from vapor phase show superior characteristics, such as high structural stability and high resistance to water adsorption. The vapor infiltration method is a simpler process than conventional sol-gel techniques and attractive for mass production of a variety of organic-inorganic composite materials and inorganic porous films.