Thermally persistent fluorosulfonyl nitrene and unexpected formation of the fluorosulfonyl radical.
Thermally persistent fluorosulfonyl nitrene and unexpected formation of the fluorosulfonyl radical.
复制标题
DOI：
10.1021/ja312073w
复制
发表时间：
2013-02
影响因子：
15
通讯作者：
Xiaoqing Zeng;H. Beckers;H. Willner
中科院分区：
文献类型：
--
作者：
Xiaoqing Zeng;H. Beckers;H. Willner
通过快速真空热解FSO（2）N（3），在气相中以高收率（高达66%）制备了耐热三重态磺酰氮烯FSO（2）N。令人惊讶的是，没有观察到FSO（2）N的重排，但通过IR（（15）N，（18）O，（34）S）光谱鉴定了长期寻找的自由基FSO（2）（22%）和痕量的SO（2）（3%）。在固体惰性气体基质中观察到氮烯光诱导Curtius重排为FNSO（2），并研究了氮烯与O（2）、NO和CO的反应。
Thermally persistent triplet sulfonyl nitrene, FSO(2)N, was produced in the gas phase in high yields (up to 66%) by flash vacuum pyrolysis of FSO(2)N(3). Surprisingly, no rearrangement of FSO(2)N was observed, but the long-sought radical FSO(2) (22%) and traces of SO(2) (3%) were identified by IR ((15)N, (18)O, (34)S) spectroscopy. The photoinduced Curtius rearrangement of the nitrene to FNSO(2) was observed in solid noble gas matrices, and reactions of the nitrene with O(2), NO, and CO were studied.