A metallic glass grating for X-ray grating interferometers fabricated by imprinting
A metallic glass grating for X-ray grating interferometers fabricated by imprinting
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DOI：
10.7567/apex.7.032501
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发表时间：
2014-03-01
影响因子：
2.3
通讯作者：
Kato, Hidenni
中科院分区：
文献类型：
--
作者：
Yashiro, Wataru;Noda, Daiji;Kato, Hidenni
在X射线光栅干涉计量中，几微米厚透射光栅的制作一直是一个关键课题。本文报道了一种用于制作干涉仪光栅的金属玻璃压印技术。我们成功地制作了一个8 μ m的间距，10 μ m厚的光栅（26毫米（2））由Pd 42.5Ni 7.5Cu 30 P20金属玻璃，通过使用该技术，作为示范，我们也进行了X射线相位成像与光栅。该技术不仅可用于制作X射线光栅，而且可用于制作中子光栅，具有高生产率和低成本的潜力，有望在不久的将来得到广泛应用。(C)2014日本应用物理学会
In X-ray grating interferometry, the fabrication of thick transmission gratings with pitches of several micrometers has been a key subject. We report on a metallic glass imprinting technique for fabricating an interferometer grating. We successfully fabricated an 8-mu m-pitch, 10-mu m-thick grating (26 mm(2)) made of Pd42.5Ni7.5Cu30P20 metallic glass by using the technique, and as a demonstration we also performed X-ray phase imaging with the grating. The technique can be applied to fabricate not only X-ray but also neutron gratings potentially at high production rates and low costs and is expected to be widely used in the near future. (C) 2014 The Japan Society of Applied Physics