On the realization of microscopic grids for local strain measurement by direct interferometric photolithography
On the realization of microscopic grids for local strain measurement by direct interferometric photolithography
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DOI：
10.1016/j.optlaseng.2007.06.009
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发表时间：
2007-12
影响因子：
4.6
通讯作者：
Raphaël Moulart;R. Rotinat;F. Pierron;G. Lerondel
中科院分区：
文献类型：
--
作者：
Raphaël Moulart;R. Rotinat;F. Pierron;G. Lerondel
为了将所谓的“网格法”的应用范围扩展到微米尺度，从而定量地表征金属合金的微观力学行为，本文报道了间距为1 ~ 10μm的微观二维光栅的优化设计。在概述了微米级全场运动学测量的最新技术之后，介绍了用于制作这种光栅的直接干涉光刻技术。的光栅的形状已使用原子力显微镜的特点，并与理论的配置文件进行比较。然后提出了标记过程中所涉及的参数的优化。其中一个目标是利用空间相移的概念测量位移场。这种优化是实现两种不同的光学技术，用于观察网格，即光学显微镜和白色光共焦干涉。最后，第一次评估的测量技术的性能给出和讨论。
In order to extend the application range of the so-called “grid method” to the micron scale and thus quantitatively characterize the micromechanical behavior of metallic alloys, we report in this paper on the optimization of microscopic 2D gratings with pitches ranging from 1 to 10μm. After an overview of the state of the art on full-field kinematic measurements at the micron scale, the direct interferometric photolithography technique, used to produce such gratings, is introduced. The shape of the gratings has been characterized using an atomic force microscope and compared with the theoretical profiles. An optimization of the parameters involved in the marking process is then presented. One of the goals lies in the measurement of displacement fields using spatial phase-shifting concept which is briefly recalled. This optimization is achieved for two different optical techniques used to observe the grids namely optical microscopy and white light confocal interferometry. Finally, a first evaluation of the performance of the measurement technique is given and discussed.