A promising method to improve the bias-stress and biased-radiation-stress stabilities of solution-processed AlOx thin films
A promising method to improve the bias-stress and biased-radiation-stress stabilities of solution-processed AlOx thin films
复制标题
DOI：
10.1016/j.radphyschem.2021.109899
复制
发表时间：
2021-11
影响因子：
2.9
通讯作者：
Yuxiao Fang;Wangying Xu;T. Zhao;I. Mitrovic;Li Yang;Chun Zhao;Cezhou Zhao
中科院分区：
文献类型：
--
作者：
Yuxiao Fang;Wangying Xu;T. Zhao;I. Mitrovic;Li Yang;Chun Zhao;Cezhou Zhao
