Structure and orientation of epitaxial titanium silicide nanowires determined by electron microdiffraction
Structure and orientation of epitaxial titanium silicide nanowires determined by electron microdiffraction
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DOI：
10.1063/1.1565173
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发表时间：
2003-05-01
影响因子：
3.2
通讯作者：
Bennett, PA
中科院分区：
文献类型：
--
作者：
Stevens, M;He, Z;Bennett, PA
用电子显微镜测定了硅化钛纳米线(NWS)在Si(111)表面自组装的晶体结构和外延取向。NWS是通过在类似于850℃的温度下在Si(111)上沉积类似于1单层钛而形成的。类型1的原子核沿Si方向呈长轴取向，鉴定为C49TiSi2。最常见的取向是平行于Si[112]的C49[01-3]和平行于Si(2-20)的C49(200)，但也有其他几种取向。第二类原子核沿Si呈长轴取向，定名为B27 TiSi，B27[02-1]方向平行于Si[111]，B27(-312)方向平行于Si(22-4)+4度。大多数净资产是不相称的，并且完全放松了压力。它们通常延伸到地表以下，具有倾斜的非相干界面。(C)2003年美国物理研究所。
The crystal structure and epitaxial orientation of self-assembled titanium silicide nanowires (NWs) on Si (111) is determined using transmission electron microdiffraction. The NWs are formed by deposition of similar to1 monolayer Ti on Si(111) at similar to850 degreesC. Type 1 NWs are oriented with long axis along Si and are identified as C49 TiSi2. The most common orientation is C49 [01-3] parallel toparallel to Si [112] and C49 (200) parallel toparallel to Si (2-20), but several other orientations are also found. Type 2 NWs are oriented with long axis along Si and are identified as B27 TiSi, with orientation B27 [02-1] parallel toparallel to Si [111] and B27 (-312) parallel toparallel to Si (22-4) + 4degrees. Most of the NWs are incommensurate and fully strain relaxed. They generally extend below the surface with inclined incoherent interfaces. (C) 2003 American Institute of Physics.