Relationship between the correction factor of the four-point probe value and the selection of potential and current electrodes
Relationship between the correction factor of the four-point probe value and the selection of potential and current electrodes
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四点探头值的修正系数与电位、电流电极选择的关系
DOI：
10.1088/0022-3735/2/2/312
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发表时间：
1969
期刊：
影响因子：
--
通讯作者：
R. Rymaszewski
中科院分区：
文献类型：
--
作者：
R. Rymaszewski
四探针因子之间的关系的理论分析的结果。对于薄膜样品上的四个电极的任何配置，如果任意选择电势和电流电极，则就绝对值而言，最多有三个不同的校正因子。存在某些组的电极配置，其中三个因子通过指数关系相关。如果电极沿着薄膜边界放置，则方程之一给出货车德堡方程。理论结果的两个实际应用中示出，即校准一些四点阵列的实验方法，和四点法利用四个沉积电极的平衡分布，以提高方电阻率测量的精度。
The results of the theoretical analysis of the relationships between the four-point probe factors are presented. For any configuration of the four electrodes on the thin film specimen there are at the most three different correction factors, in respect to the absolute value, if the potential and current electrodes are arbitrarily chosen. There are certain groups of electrode configurations for which the three factors are related by exponential relationships. If the electrodes are placed along the thin film boundary, one of the equations gives Van der Pauw's equation. Two practical applications of the theoretical results are shown, namely an experimental method of calibrating some four-point arrays, and the four-point method utilizing the balanced distribution of the four deposited electrodes, in order to increase the precision of the sheet resistivity measurement.