Interface sharpening in miscible Ni/Cu multilayers studied by atom probe tomography
Interface sharpening in miscible Ni/Cu multilayers studied by atom probe tomography
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DOI：
10.1063/1.3658390
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发表时间：
2011-10-31
影响因子：
4
通讯作者：
Erdelyi, Zoltan
中科院分区：
文献类型：
--
作者：
Balogh, Zoltan;Chellali, Mohammed Reda;Erdelyi, Zoltan
用原子探针层析技术研究了Ni/Cu多层膜的界面。为此，制备了具有尖锐或人工涂抹界面的试样，并在773 K退火前后进行了研究。由于原子探针的三维亚纳米分辨率，层界面的局部化学分析成为可能，而没有晶界或几何粗糙度的干扰。与经典的期望的可混溶系统，但在协议与最近的理论考虑，扩散减少了化学宽度的接口高达50%。(C)2011年美国物理学会。[doi：10.1063/1.3658390]
Interfaces of Ni/Cu multilayers were studied by atom probe tomography. To this aim, specimens with sharp or artificially smeared interfaces were prepared and investigated before and after annealing at 773 K. Owing to three-dimensional subnanometer resolution of the atom probe, local chemical analysis of layer interfaces becomes possible without interferences of grain boundaries or geometric roughness. In contrast to the classical expectation for a miscible system, but in agreement with more recent theoretical considerations, diffusion reduces the chemical width of the interfaces by up to 50%. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3658390]