HISTOPATHOLOGICAL EVALUATION OF MATERIALS IMPLANTED IN CEREBRAL-CORTEX

HISTOPATHOLOGICAL EVALUATION OF MATERIALS IMPLANTED IN CEREBRAL-CORTEX
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DOI:
10.1007/bf00689766
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发表时间:
1978-01-01
影响因子:
12.7
通讯作者:
STENSAAS, LJ
STENSAAS, LJ
中科院分区:
医学1区
文献类型:
--
作者:
STENSAAS, SS;STENSAAS, LJ

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通过光学显微镜和电子显微镜分析了小的、穿透性的金属和非金属植入物对大脑皮层的组织病理学变化。在组织准备的所有阶段,针状植入物都留在原位,并与皮层一起嵌入塑料中。根据反应性细胞成分,脑植入物边界的变化分为非反应性、反应性或毒性。非反应性材料有几种塑料和金属,如Al、Au、Pt和w。这些植入物的边界显示很少或没有胶质瘤,在5 μ m范围内显示正常的神经堆和突触。M的种植体表面。Ta或二氧化硅等活性物质的边界以多核巨细胞和10 μ m的薄层为标志。M)结缔组织。铁和铜等有毒物质通过细胞结缔组织囊和星形细胞增生区从皮质神经堆中分离出来。钴是剧毒物质,在结缔组织和星形胶质细胞区产生更广泛的变化。显然,各种各样的材料都能被大脑很好地耐受,并可用于制造神经假肢装置。
Histopathological changes of the cerebral cortex [rabbit] in response to small, penetrating metal and non-metal implants were analyzed by light microscopy and EM. The needle-shaped implants were left in place during all stages of histological preparation and embedded in plastic together with the cortex. Changes of the brain-implant boundary were classified as non-reactive, reactive, or toxic, according to the reactive cellular constituents. Among the non-reactive materials were several plastics and metals such as Al, Au, Pt and W. The boundary of these implants displayed little or no gliosis and normal neuropile with synapses within 5 .mu.m of the implant''s surface. The boundary of reactive materials such as Ta or silicon dioxide was marked by multinucleate giant cells and a thin layer (10 .mu.m) of connective tissue. Toxic materials such as Fe and Cu were separated from the cortical neuropile by a capsule of cellular connective tissue and a zone of astrocytosis. Co, highly toxic material, produced more extensive changes in the zones of connective tissue and astrocytes. Apparently a variety of materials are well tolerated by the brain and could be used in the fabrication of neuroprosthetic devices.