Study of AlN Nucleation by Directional Sputtering for Growth of Orientation-Controlled GaN on Si(001) Substrates
Study of AlN Nucleation by Directional Sputtering for Growth of Orientation-Controlled GaN on Si(001) Substrates
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Si(001) 衬底上定向溅射 AlN 成核用于定向控制 GaN 生长的研究
DOI:
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发表时间:
2016
期刊:
影响因子:
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通讯作者:
and H. Amano
中科院分区:
文献类型:
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作者:
H. J. Lee;S. Y. Bae;K. Lekhal;A. Tamura;Y. Honda;and H. Amano