Fabrication of cone-shaped subwavelength structures by utilizing a confined convective self-assembly technique and inductively coupled-plasma reactive-ion etching
Fabrication of cone-shaped subwavelength structures by utilizing a confined convective self-assembly technique and inductively coupled-plasma reactive-ion etching
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DOI：
10.1116/1.3556962
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发表时间：
2011-03
影响因子：
1.4
通讯作者：
Dae-Seon Kim;Min-Su Park;Jae‐Hyung Jang
中科院分区：
文献类型：
--
作者：
Dae-Seon Kim;Min-Su Park;Jae‐Hyung Jang
Cone-shaped subwavelength structures (SWSs) were fabricated on a GaAs substrate by utilizing a confined convective self-assembly process followed by inductively coupled-plasma reactive-ion etching. A self-assembled polystyrene monolayer was used as an etch mask for pattern transfer onto the GaAs substrate. The fabricated SWS, having a cone profile with an aspect ratio of 1.5 and a 300 nm pitch, exhibited very low reflectance throughout the solar spectrum range and exhibited wide tolerance to different optical incidence angles. Reflectance of the cone-shaped SWS on the GaAs surface was less than 4% in a spectral range of 300–1000 nm under a normal incidence condition.
