Cantilever with High Aspect Ratio Nanopillars on Its Top Surface for Moisture Detection in Electronic Products
Cantilever with High Aspect Ratio Nanopillars on Its Top Surface for Moisture Detection in Electronic Products
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DOI:
10.1002/adem.201700203
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发表时间:
2017-06
影响因子:
3.6
通讯作者:
Nguyen Van Toan;M. Toda;T. Hokama;T. Ono
中科院分区:
文献类型:
--
作者:
Nguyen Van Toan;M. Toda;T. Hokama;T. Ono
This work reports the patterning silicon pillars by metal‐assisted chemical etching (MACE) process as a post process on a silicon cantilever for a moisture detection. Although the cantilever is very fragile, the patterning of the pillar structures on the cantilever has been successfully demonstrated. The cantilever coated with a material absorbing water (such as polyimide and mesoporous silica) can use as a humidity sensor. Its bending is due to the surface stress change from water molecule absorption. However, the bending of the cantilever is usually at a small value. Here, the silicon cantilever with high aspect ratio pillars on its surface is proposed, which is expected for a larger bending of the cantilever during the water molecule absorption. The moisture detection utilizes the principle that the pillars stack together based upon the condensation behavior of a water vapor on their surfaces.