Structural, magnetic, and mechanical properties of 5μm thick SmCo films suitable for use in microelectromechanical systems
Structural, magnetic, and mechanical properties of 5μm thick SmCo films suitable for use in microelectromechanical systems
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适用于微机电系统的 5μm 厚 SmCo 薄膜的结构、磁性和机械性能
DOI：
10.1063/1.2840131
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发表时间：
2008
影响因子：
3.2
通讯作者：
N. Dempsey
中科院分区：
文献类型：
--
作者：
A. Walther;K. Khlopkov;O. Gutfleisch;D. Givord;N. Dempsey
采用磁控溅射法在Si衬底上沉积了5μm厚的SmCo薄膜。研究沉积温度（Tdep ≤ 600°C）对结构、磁性和机械性能的影响表明，在350°C的相对较低温度下沉积的薄膜可获得最佳性能[最高程度的面内织构、最大面内矫顽力和剩磁（分别为1.3和0.8T），且无薄膜剥离]。该温度与膜集成到微机电系统中是相容的。在保持靶电位不变的情况下，通过增加靶的表面积（从7 ~ 81 cm ~ 2），使沉积速率从3.6 μ m·cm ~（-1）提高到18 μm·cm ~（-1）。机械完整的膜可以通过沉积到预图案化的膜上或通过掩模沉积来制备。
5μm thick SmCo films were deposited onto Si substrates using triode sputtering. A study of the influence of deposition temperature (Tdep⩽600°C) on the structural, magnetic, and mechanical properties has shown that optimum properties [highest degree of in-plane texture, maximum in-plane coercivity and remanence (1.3 and 0.8T, respectively), and no film peel-off] are achieved for films deposited at the relatively low temperature of 350°C. This temperature is compatible with film integration into microelectromechanical systems. The deposition rate was increased from 3.6to18μm∕h by increasing the surface area of the target from 7to81cm2 while keeping the target potential fixed. Mechanically intact films could be prepared by deposition onto prepatterned films or deposition through a mask.
磁控溅射SmCox和Sm(Co,Cu) 5 薄膜的显微结构和矫顽力
DOI：
--
发表时间：
2007
期刊：
J. Mag. Mag. Mat. 310・1
影响因子：
--
作者：
J. Zhang;Y. K. Takahashi;R. Gopalan;K. Hono
通讯作者：
K. Hono