Equiprobability-Based Local Response Surface Method for High-Sigma Yield Estimation With Both High Accuracy and Efficiency
Equiprobability-Based Local Response Surface Method for High-Sigma Yield Estimation With Both High Accuracy and Efficiency
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DOI：
10.1109/tcad.2022.3193875
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发表时间：
2023-04
影响因子：
2.9
通讯作者：
Xiang Liu;P. Ren;Haibao Chen;Zhigang Ji;Junhua Liu;Runsheng Wang;Jianfu Zhang;Ru Huang
中科院分区：
文献类型：
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作者：
Xiang Liu;P. Ren;Haibao Chen;Zhigang Ji;Junhua Liu;Runsheng Wang;Jianfu Zhang;Ru Huang
随着综合电路中不断增加的晶体管密度和记忆能力，高偏压产量的估计已成为日益关注的问题。这项工作提出了一种基于策略性的局部响应表面（ELRS）方法，该方法可以以高准确性和效率进行高素质的产量估计。与最先进的文献相比，该方法用6T-SRAM证明，与最先进的方法相比，准确性提高了十倍以上。
With the ever-increasing transistor density and memory capability in integrated circuits, the high-sigma yield estimation has become a growing concern. This work presents an equiprobability-based local response surface (ELRS) method that can perform a high-sigma yield estimation with both high accuracy and efficiency. Demonstrating with 6T-SRAM, the proposed method exhibits more than ten times improvement in accuracy when compared with the state-of-the-art while maintaining the efficiency to the best record in the literature.