A three-dimensional optical photonic crystal with designed point defects
A three-dimensional optical photonic crystal with designed point defects
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DOI：
10.1038/nature02575
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发表时间：
2004-06-03
期刊：
影响因子：
64.8
通讯作者：
Smith, HI
中科院分区：
文献类型：
--
作者：
Qi, MH;Lidorikis, E;Smith, HI
光子晶体(1-3) 为光学器件的小型化和集成化提供了前所未有的机遇。它们还表现出各种新的物理现象，包括抑制或增强自发发射、低阈值激光和量子信息处理(4)。用于制造三维 (3D) 光子晶体的各种技术，例如硅微加工 (5)、晶圆熔合 (6)、全息光刻 (7)、自组装 (8,9)、成角度蚀刻 (10)、显微操作 (11)、掠射角沉积 (12) 和自动克隆 (13,14) - 已被提出并取得了不同程度的成功。然而，制造功能性 3D 器件的关键一步，即以可控方式结合微腔或波导，尚未在光波长上实现。在这里，我们介绍了 3D 光子晶体的制造方法，该晶体特别适合使用光刻逐层方法进行光学器件集成 (15)。在制造过程中引入了点缺陷微腔，光学测量表明它们在电信波长（1.3-1.5μm）附近具有共振特征。近红外反射率和透射率的测量与数值模拟非常吻合。
Photonic crystals(1-3) offer unprecedented opportunities for miniaturization and integration of optical devices. They also exhibit a variety of new physical phenomena, including suppression or enhancement of spontaneous emission, low-threshold lasing, and quantum information processing(4). Various techniques for the fabrication of three-dimensional (3D) photonic crystals-such as silicon micromachining(5), wafer fusion bonding(6), holographic lithography(7), self-assembly(8,9), angled-etching(10), micromanipulation(11), glancing-angle deposition(12) and autocloning(13,14)-have been proposed and demonstrated with different levels of success. However, a critical step towards the fabrication of functional 3D devices, that is, the incorporation of microcavities or waveguides in a controllable way, has not been achieved at optical wavelengths. Here we present the fabrication of 3D photonic crystals that are particularly suited for optical device integration using a lithographic layer-by-layer approach(15). Point-defect microcavities are introduced during the fabrication process and optical measurements show they have resonant signatures around telecommunications wavelengths (1.3-1.5 mum). Measurements of reflectance and transmittance at near-infrared are in good agreement with numerical simulations.