Benefit of dual layer silicon nitride anti-reflection coating
Benefit of dual layer silicon nitride anti-reflection coating
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DOI：
10.1109/pvsc.2005.1488355
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发表时间：
2005-08
期刊：
影响因子：
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通讯作者：
B. Kumar;T. Baskara Pandian;E. Sreekiran;S. Narayanan
中科院分区：
文献类型：
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作者：
B. Kumar;T. Baskara Pandian;E. Sreekiran;S. Narayanan
世界上大多数商业硅太阳能电池技术是基于丝网印刷技术，具有或不具有二氧化钛、二氧化硅或最近的PECVD氮化硅的单层或组合层。大多数关于双层减反射膜的报道工作是基于两种不同的材料。为此目的，在双层氮化硅上做的工作较少。在这项工作中，提出了一种简单的方法来利用双层氮化硅。通过这种方法，与单层氮化硅层相比，已经实现了加权平均反射率的改善。
Majority of commercial silicon solar cell technology around the world is based on screen print technology with or without a single or combined layer of titanium dioxide, silicon dioxide or recently PECVD silicon nitride. Most of the reported work on dual layer anti-reflection coating is based on two different materials. Less work has been done on dual layer silicon nitride for this purpose. In this work, a simple approach is presented to utilize dual layer silicon nitride. An improvement in weighted average reflectance has been achieved compared to single layer silicon nitride layer by this approach.