A transcriptional insulator element, the su(Hw) binding site, protects a chromosomal DNA replication origin from position effects.
A transcriptional insulator element, the su(Hw) binding site, protects a chromosomal DNA replication origin from position effects.
复制标题
转录绝缘子元件(su(Hw) 结合位点)可保护染色体 DNA 复制起点免受位置效应的影响。
DOI:
10.1128/mcb.17.4.2202
复制
发表时间:
1997
影响因子:
5.3
通讯作者:
Tower,J
中科院分区:
文献类型:
--
作者:
Lu,L;Tower,J
Eukaryotic chromosomes are organized into domains of activity for both transcription and DNA replication. Transcriptional “border”, or “insulator”, elements have been implicated in mediating the organization of transcriptional domains. However, the DNA sequence elements which might demarcate domains of DNA replication activity are unknown. su(Hw) protein binding sites [su(Hw)BSs] are potent transcriptional insulator elements which can block enhancer action, as well as positive and negative chromosomal position effects. Here we report that flanking su(Hw)BSs can also create a chromosomal domain permissible for activity of the chorion gene DNA replication origin. DuringDrosophilaoogenesis the chorion (eggshell) gene loci are amplified ~80-fold through repeated initiation of DNA replication. Thecis-acting amplification control element, on the third chromosome (ACE3), is required for high levels of amplification initiating at the nearby major origin of replication, Ori-β. A transgenic chorion locus construct containing ACE3 and Ori-β was able to amplify but was extremely sensitive to position effects: only 7 of 21 independent insertions amplified >10-fold. The inclusion of flanking su(Hw)BSs in the construct dramatically protected DNA replication from position effects: 31 of 31 insertions now amplified >10-fold, and this protection was reduced in asu(Hw)mutant background. Amplification was equal on both sides of the su(Hw)BS, demonstrating that replication fork passage is not significantly impeded by these sites. Inclusion of only a single su(Hw)BS in the construct did not detectably protect the chorion gene DNA replication origin from position effects.