X-ray photoelectron study of fluorinated graphite intercalation compounds
X-ray photoelectron study of fluorinated graphite intercalation compounds
复制标题
DOI：
10.1007/bf02903607
复制
发表时间：
1998-11-01
影响因子：
0.8
通讯作者：
Nazarov, AS
中科院分区：
文献类型：
--
作者：
Asanov, IP;Paasonen, VM;Nazarov, AS
氟化石墨C2F的插层化合物。用X射线光电子能谱研究了YR，其中R是苯、六氟苯、丙酮或四氯化锗。C1s和F1s内能级的结合能表明，氟化石墨中的C-F化学键在一氟化石墨的共价键前面有很大的不同。分析了氟化石墨基质和GeCl4中原子内能级的结合能，认为主体基质与客体分子之间不存在化学结合。
Intercalated compounds of fluorinated graphite C2F . yR, where R is benzene, hexafluorobenzene, acetone, or germanium tetrachloride, are studied by X-ray photoelectron spectroscopy. The binding energies of the C1s and F1s inner levels indicate that the C-F chemical bond in fluorinated graphite differs dramatically front the covalent bond in graphite monofluoride. The binding energies of the inner levels in atoms of the graphite fluoride matrix and GeCl4 are analyzed and it is concluded that there is no chemical binding between the host matrix and the guest molecule.