Synchronous scan-projection lithography on overall circumference of fine pipes with a diameter of 2 mm
Synchronous scan-projection lithography on overall circumference of fine pipes with a diameter of 2 mm
复制标题
DOI：
10.7567/jjap.55.06gp13
复制
发表时间：
2016-05
影响因子：
1.5
通讯作者：
T. Horiuchi;Takahiro Furuhata;Hideyuki Muro
中科院分区：
文献类型：
--
作者：
T. Horiuchi;Takahiro Furuhata;Hideyuki Muro
利用新研制的原型曝光系统对小直径管道表面的扫描投影曝光进行了研究。为了在粗糙度大于半导体晶片的圆管表面上印刷厚抗蚀剂图案，必须确保非常大的焦深。为此，使用具有0.089的低数值孔径的照相机透镜作为投影透镜，并且瞬时曝光区域受到宽度为800 µm的窄缝的限制。因此，通过线性移动掩模版和同步旋转管道，将平坦掩模版上的图案复制在管道表面上。通过使用具有倾斜的线和空间图案的掩模版，在外径为2 mm并涂有10 µ m厚的负性抗蚀剂的不锈钢管上成功复制了宽度为30 µm的螺旋图案。在开始和停止边缘复制的图案被平滑无缝地缝合。
The scan-projection exposure of small-diameter pipe surfaces was investigated using a newly developed prototype exposure system. It is necessary to secure a very large depth of focus for printing thick resist patterns on round pipe surfaces with a roughness larger than that of semiconductor wafers. For this reason, a camera lens with a low numerical aperture of 0.089 was used as a projection lens, and the momentary exposure area was limited by a narrow slit with a width of 800 µm. Thus, patterns on a flat reticle were replicated on a pipe surface by linearly moving the reticle and rotating the pipe synchronously. By using a reticle with inclined line-and-space patterns, helical patterns with a width of 30 µm were successfully replicated on stainless-steel pipes with an outer diameter of 2 mm and coated with a 10-µm-thick negative resist. The patterns replicated at the start and stop edges were smoothly stitched seamlessly.