Plasmonic Metasurfaces with High UV–Vis Transmittance for Photopatterning of Designer Molecular Orientations
Plasmonic Metasurfaces with High UV–Vis Transmittance for Photopatterning of Designer Molecular Orientations
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DOI：
10.1002/adom.201900117
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发表时间：
2019-03
影响因子：
9
通讯作者：
Hao Yu;Miao Jiang;Yubing Guo;T. Turiv;Wu Lu;V. Ray;O. Lavrentovich;Q. Wei
中科院分区：
文献类型：
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作者：
Hao Yu;Miao Jiang;Yubing Guo;T. Turiv;Wu Lu;V. Ray;O. Lavrentovich;Q. Wei
利用等离子体超表面设计分子取向的光模式的最新发展促进了液晶的许多新应用；而超掩模的光学效率仍然是一个关键问题，特别是在紫外线区域。本文提出了一种由平行六面体阵列构成的等离子体超表面的新设计，它在紫外-可见波长范围内具有很高的宽带透射率。结果表明，该等离子体元掩膜具有两个极化峰，分别来自于腔模式和晶格共振，并证明了使用该元掩膜可以在显著减少曝光时间的情况下进行复杂的设计分子取向的光模化。这种高效率的宽带等离子体超表面不仅对分子取向的高分辨率光图像化很重要，而且还适用于紫外和近紫外区域的各种其他平面光学应用。
Recent developments of utilizing plasmonic metasurfaces in photopatterning of designer molecular orientations have facilitated numerous new applications of liquid crystals; while the optical efficiency of the metamasks remains a critical issue, especially in the UV region. Here a new design of plasmonic metasurfaces made of parallelepiped arrays is presented which yield very high and broadband transmission in the UV–vis wavelength range. It is shown that this plasmonic metamask exhibits two polarization peaks originated from a cavity mode and lattice resonance respectively and demonstrated that complex designer molecular orientations can be photopatterned by using this metamask with significantly reduced exposure time. This type of high‐efficiency broadband plasmonic metasurfaces is not only important for high resolution photopatterning of molecular orientation but also tailorable for various other flat optics applications in the UV and near UV regions.