Temperature dependent photoluminescence of lateral polarity junctions of metal organic chemical vapor deposition grown GaN

Temperature dependent photoluminescence of lateral polarity junctions of metal organic chemical vapor deposition grown GaN
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DOI:
10.1063/1.3656987
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发表时间:
2011-11
影响因子:
3.2
通讯作者:
R. Kirste;R. Collazo;G. Callsen;M. R. Wagner;T. Kure;J. Reparaz;S. Mita;Jinqiao Xie;A. Rice;J. Tweedie;Z. Sitar;A. Hoffmann
R. Kirste;R. Collazo;G. Callsen;M. R. Wagner;T. Kure;J. Reparaz;S. Mita;Jinqiao Xie;A. Rice;J. Tweedie;Z. Sitar;A. Hoffmann
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
R. Kirste;R. Collazo;G. Callsen;M. R. Wagner;T. Kure;J. Reparaz;S. Mita;Jinqiao Xie;A. Rice;J. Tweedie;Z. Sitar;A. Hoffmann

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We report on fundamental structural and optical properties of lateral polarity junctions in GaN. GaN with Ga- to N-polar junctions was grown on sapphire using an AlN buffer layer. Results from scanning electron microscopy and Raman spectroscopy measurements indicate a superior quality of the Ga-polar GaN. An extremely strong luminescence signal is observed at the inversion domain boundary (IDB). Temperature dependent micro photoluminescence measurements are used to reveal the recombination processes underlying this strong emission. At 5 K the emission mainly arises from a stripe along the inversion domain boundary with a thickness of 4-5 μm. An increase of the temperature initially leads to a narrowing to below 2 μm emission area width followed by a broadening at temperatures above 70 K. The relatively broad emission area at low temperatures is explained by a diagonal IDB. It is shown that all further changes in the emission area width are related to thermalization effects of carriers and defects attracte...