ICCAD-2013 CAD contest in mask optimization and benchmark suite
ICCAD-2013 CAD contest in mask optimization and benchmark suite
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DOI：
10.1109/iccad.2013.6691131
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发表时间：
2013-11
期刊：
影响因子：
--
通讯作者：
Shayak Banerjee;Zhuo Li;S. Nassif
中科院分区：
文献类型：
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作者：
Shayak Banerjee;Zhuo Li;S. Nassif
光学显微光刻是一种使用通过称为掩模的模板传输的光在晶片上印刷一组形状的技术。反复打印和堆叠这些形状来构建电路，使我们能够大批量制造芯片。然而，这种技术现在已经达到了分辨率的基本物理极限。目前193 nm波长的光不再足以可靠地转移现在在100 nm以下尺寸范围内的图案。这已经导致在优化光刻掩模以预补偿由光刻工艺引入的失真方面的研究增加。这被称为掩码优化。在这次比赛中，学生提供了一个样品光刻模型，模拟转移到晶圆上的掩模图案。假设掩模是像素化模板，其中每个像素都可以打开或关闭，以指示光线通过或被阻挡的位置。参赛者还被提供模型来预测其模式的鲁棒性，即在所传递的模式中有多少可变性。给定这些工具，目标是最小化晶片图像中的可变性，如通过工艺可变性（PV）带测量的。这受到运行时间和满足模式保真度的约束，即传输的模式应该类似于目标模式。基准以几何形状的集合的形式提供，其中的每一个提供了在亚波长下打印的挑战。
Optical microlithography is the technique of printing a set of shapes on a wafer using light transmitted through a template called a mask. Repeatedly printing and stacking such shapes on top of each other to build electrical circuits allows us to manufacture chips in high volume. However this technique has now reached its fundamental physical limits of resolution. Current 193nm wavelength light is no longer sufficient to reliably transfer patterns which are now in the sub-100nm dimensional range. This has led to increased research in optimizing lithographic masks to pre-compensate for distortions introduced by the lithographic process. This is called mask optimization. In this contest, students are provided with a sample lithographic model which simulates the transfer of a mask pattern on to wafer. The mask is assumed to be a pixelated template, where every pixel can be turned on or off, to indicate where light passes through, or is blocked. Contestants are also provided with models to predict the robustness of their pattern i.e. how much variability is in the transferred pattern. Given these tools, the objective is to minimize the variability in the wafer image, as measured by process variability (PV) bands. This is subject to the constraints of runtime and satisfying pattern fidelity i.e. the transferred pattern should resemble the target pattern. Benchmarks are provided in the form of collections of geometric shapes, each of which provides a challenge in printing at sub-wavelength.