Injection compression molding of high-aspect-ratio nanostructures
Injection compression molding of high-aspect-ratio nanostructures
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DOI：
10.1116/1.3662405
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发表时间：
2011-11-01
影响因子：
1.4
通讯作者：
Nakao, Masayuki
中科院分区：
文献类型：
--
作者：
Nagato, Keisuke;Hamaguchi, Tetsuya;Nakao, Masayuki
高纵横比的纳米结构复制通过注射压缩成型。使用用于光盘（数字多功能盘）的复制技术和具有宽度和高度为200和400 nm的图案的Ni压模来研究模具温度和图案形状对复制度的影响。较高的模具温度和较小的Ni压模的面积占空比（丘面积/单位面积），即，复制品的较大面积占空比导致较好的复制，因为具有较小面积占空比的Ni压模抑制了表层的形成。(C)2011年美国真空学会。[DOI：10.1116/1.3662405]
High-aspect-ratio nanostructures were replicated by injection compression molding. The effects of the mold temperature and pattern shape on the degree of replication were investigated using a replication technique for optical disks (digital versatile disks) and a Ni stamper with patterns with a width and height of 200 and 400 nm. A higher mold temperature and a smaller area-duty ratio (hill area/unit area) of the Ni stamper, i.e., a larger area-duty ratio of the replica resulted in better replication because a Ni stamper with a smaller area-duty ratio suppresses the formation of a skin layer. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3662405]