Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate
Formation of (100)-Textured Si Film Using an Excimer Laser on a Glass Substrate
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使用准分子激光器在玻璃基板上形成 (100) 纹理化硅薄膜
DOI：
10.1143/jjap.42.l135
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发表时间：
2003
影响因子：
1.5
通讯作者：
J. Sato
中科院分区：
文献类型：
--
作者：
D. Gosain;Akio Machida;T. Fujino;Yukihisa Hitsuda;K. Nakano;J. Sato
We investigated the texture of excimer-laser crystallized Si film. For the first time, Si thin films with more than 96% (100) texture have been produced using excimer-laser crystallization of a-Si on a glass substrate. The (100) textured film has rectangular grains with edges parallel to the (110) direction. Results of scanning electron microscopy (SEM), electron backscatter diffraction patterns (EBSP), X-ray diffraction and transmission electron microscopy (TEM) are presented. The results are interpreted on the basis of Si/SiO2 interface energy and a new grain-selection model.
