Optical sensor design for fast and process-robust position measurements on small diffraction gratings
Optical sensor design for fast and process-robust position measurements on small diffraction gratings
复制标题
DOI:
10.1016/j.optlaseng.2020.106267
复制
发表时间:
2020-11-01
影响因子:
4.6
通讯作者:
Osten, Wolfgang
中科院分区:
文献类型:
--
作者:
Godecke, Maria Laura;Bett, Claudia Monika;Osten, Wolfgang
We propose an optical sensor design for position measurements with sub-nanometer precision on small diffraction gratings with a wide pitch range from 400 nm to approximately 10 mu m. The interferometric position detection is based on a self-reference introduced via 180 degrees-rotational shearing. A lateral scan of the target generates a periodically varying intensity signal whose phase encodes the target position. The small size of the target (down to approximately 5 x 5 mu m(2)) necessitates an even smaller illumination-spot size on the target for the scanning procedure. In our sensor, a spot diameter of only 2-3 mu m is realized by illuminating large off-axis areas in the entrance pupil of a microscope objective with high numerical aperture (NA). A set of two complementary aperture stops ensures blocking of the specular reflection, thus allowing for a signal contrast close to one. Due to the large NA-extent of the illumination profile, the sensor is inherently sensitive for aberrations. We correct the resulting positioning error via additional beam monitoring in the pupil plane. A tolerance analysis in terms of a comprehensive simulation study shows that the sensor performance is robust against typical target and parameter variations. Furthermore, first proof-of-principle measurements validate the practical feasibility.