Rapid printing of nanoporous 3D structures by overcoming the proximity effects in projection two-photon lithography
Rapid printing of nanoporous 3D structures by overcoming the proximity effects in projection two-photon lithography
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DOI：
10.1080/17452759.2023.2230979
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发表时间：
2023-12-31
影响因子：
10.6
通讯作者：
Saha, Sourabh K.
中科院分区：
文献类型：
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作者：
Kim, Harnjoo;Pingali, Rushil;Saha, Sourabh K.
具有纳米级特征和孔隙度的大型和确定性3D结构在各种应用中都很有价值，但由于邻近效应导致相邻打印特征合并，因此打印具有挑战性。在这里，通过最大限度地减少投影双光子光刻（P-TPL）中的接近效应，这是一种基于高通量光聚合的3D打印技术，克服了这一挑战。通过实证研究和基于物理的计算模型，证明了邻近效应是由不同的光学和化学源引起的。已经确定了单独减少这些来源的加工条件。利用这些见解产生了一种分散的P-TPL技术，能够快速打印3D结构，其特征小于300 nm，孔隙小于700 nm，每层速率大于0.5 mm(2)/s。由于分散P-TPL的速度比传统的点扫描TPL快50倍，它可以实现纳米多孔3D结构的可扩展打印。
Large and deterministic 3D structures with nanoscale features and porosities are valuable for various applications but are challenging to print due to the proximity effects that lead to the merging of adjacently printed features. Here, this challenge has been overcome by minimising the proximity effects in projection two-photon lithography (P-TPL), which is a high-throughput photopolymerization-based 3D printing technique. Through empirical studies and physics-based computational models, it is demonstrated that the proximity effects arise from distinct optical and chemical sources. Processing conditions that individually minimise these sources have been identified. These insights have been leveraged to generate an interspersing P-TPL technique capable of rapidly printing 3D structures with features smaller than 300 nm, pores finer than 700 nm, and at rates greater than 0.5 mm(2)/s per layer. As interspersing P-TPL is up to 50 times faster than conventional point-scanning TPL, it can enable the scalable printing of nanoporous 3D structures.