Amorphous Carbon Coating Material with Low Secondary Electron Yield for High Energy Particle Accelerator
Amorphous Carbon Coating Material with Low Secondary Electron Yield for High Energy Particle Accelerator
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高能粒子加速器用低二次电子产率非晶碳涂层材料
DOI：
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发表时间：
2018
期刊：
影响因子：
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通讯作者：
王勇
中科院分区：
文献类型：
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作者：
张宇心;王一刚;葛晓琴;张波;尉伟;裴香涛;范乐;王勇
我们解决了现代高能和高亮度粒子加速器中的电子云问题。在安装于粒子加速器储存环所用管道（Φ86毫米×1000毫米）内壁的不锈钢基底上，通过直流磁控溅射沉积了在超高真空中具有低二次电子产额（SEY）的非晶碳（a - C）涂层。利用扫描电子显微镜和X射线光电子能谱研究了a - C涂层的微观结构以及电子束剂量对SEY的影响。结果表明，在电子束剂量为1×10－8库仑/平方毫米的正常撞击下，具有强界面附着力的高纯度且相当粗糙的a - C涂层的SEY估计为1.132。我们认为a - C薄膜可能是一种有前途的表面改性材料，可用于抑制电子云并提高粒子束的稳定性。
We addressed the electron cloud problem in modern high-energy and high-luminosity particle accelerators．The amorphous carbon(a-C) coatings，with low secondary electron yield(SEY) in ultra-high vacuum，were deposited by DC magnetron sputtering on the stainless steel substrate installed on the inner wall of a pipe(Φ86 mm × 1000 mm) to be used as the storage ring in the particle accelerator． The influence of the microstructures of the a-C coatings and dose of electron beam on SEY was investigated with scanning electron microscopy and X-ray photoelectron spectroscopy．The results show that normally impacted by an e-beam at a dose of 1 × 10 － 8 C /mm － 2，SEY of the highly pure and fairly rough a-C coatings with strong interfacial adhesion was estimated to be 1. 132． We suggest that a-C film may be a promising surface modification material to suppress electron cloud and to enhance the particle.beam stability．