Tomographic mapping analysis of lattice distortions in the depth direction of high-Ge-content SiGe films with compositionally graded buffer layers using nanobeam X-ray diffraction
Tomographic mapping analysis of lattice distortions in the depth direction of high-Ge-content SiGe films with compositionally graded buffer layers using nanobeam X-ray diffraction
复制标题
使用纳米束 X 射线衍射对具有成分梯度缓冲层的高 Ge 含量 SiGe 薄膜深度方向的晶格畸变进行层析成像分析
DOI：
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发表时间：
2018
期刊：
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通讯作者：
Akira Sakai
中科院分区：
文献类型：
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作者：
Kazuki Shida;Shotaro Takeuchi;Tetsuya Tohei;Yasuhiko Imai;Shigeru Kimura; Andreas Schulze;Matty Caymax;Akira Sakai
